Optical Proximity Correction
Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The need for OPC is seen mainly in the making of semiconductor devices and is due to the limitations of light to maintain the edge placement integrity of the original design, after processing, into the etched image on the silicon wafer.
This course will introduce the history and status quo of OPC technology, the numerical optimization concept and algorithm. It also covers Source Mask Optimization (SMO) technology.
Teach Optical Proximity Correction in your classroom.