Innovation and collaborative, synchronized program management for new programs
Aerospace & Defense
Innovation and collaborative, synchronized program management for new programs
Explore IndustryAutomotive & Transportation
Integration of mechanical, software and electronic systems technologies for vehicle systems
Explore IndustryConsumer Products & Retail
Product innovation through effective management of integrated formulations, packaging and manufacturing processes
Explore IndustryElectronics & Semiconductors
New product development leverages data to improve quality and profitability and reduce time-to-market and costs
Explore IndustryEnergy & Utilities
Supply chain collaboration in design, construction, maintenance and retirement of mission-critical assets
Explore IndustryHeavy Equipment
Construction, mining, and agricultural heavy equipment manufacturers striving for superior performance
Explore IndustryIndustrial Machinery
Integration of manufacturing process planning with design and engineering for today’s machine complexity
Explore IndustryInsurance & Financial
Visibility, compliance and accountability for insurance and financial industries
Explore IndustryMarine
Shipbuilding innovation to sustainably reduce the cost of developing future fleets
Explore IndustryMedia & Telecommunications
Siemens PLM Software, a leader in media and telecommunications software, delivers digital solutions for cutting-edge technology supporting complex products in a rapidly changing market.
Explore IndustryMedical Devices & Pharmaceuticals
“Personalized product innovation” through digitalization to meet market demands and reduce costs
Explore IndustrySmall & Medium Business
Remove barriers and grow while maintaining your bottom line. We’re democratizing the most robust digital twins for your small and medium businesses.
Explore IndustryPDM with Teamcenter Curriculum Package
PDM with Teamcenter Curriculum Package
Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The need for OPC is seen mainly in the making of semiconductor devices and is due to the limitations of light to maintain the edge placement integrity of the original design, after processing, into the etched image on the silicon wafer.
This course will introduce the history and status quo of OPC technology, the numerical optimization concept and algorithm. It also covers Source Mask Optimization (SMO) technology.
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