Innovation and collaborative, synchronized program management for new programs
FOR RELEASE Monday, June 12, 2006
PLANO, Texas – UGS Corp., a leading global provider of product lifecycle management (PLM) software and services, today announced Metris, of Leuven, Belgium, has delivered substantial off-line programming simulation performance improvements to its Camio Studio customers by integrating enhanced collision detection functionality developed by UGS and its D-Cubed organization.
Camio Studio’s improved simulation speed is based on new “collision on a path” functionality in the latest release of the D-Cubed Collision Detection Manager (CDM) software, which is part of UGS’ PLM Components family of offerings. Collision detection algorithms often require applications to simulate motion by transforming bodies in a step-wise fashion, checking for collisions at each step. If the simulation step size is too large, real-world collisions may be missed. If the step size is too small, more steps are required and performance is reduced. The latest release of the CDM enables applications to specify a linear path for a moving body. The CDM identifies any potential collisions along the path, eliminating the requirement for a step-wise analysis, bringing dramatic improvements to simulation performance and reliability.
“The new collision-on-a-path functionality determines potential collisions between coordinate measuring machine (CMM) probes and work pieces more quickly than ever, without any compromise on accuracy,” said John Wootton, Director, Software Engineering, Metris UK Ltd. “Our users value the fact that high performance is possible without having to approximate models.”
The CDM computes accurate collision and clearance results on precise geometric models with exceptional performance. Other offerings operate on faceted (tessellated) approximations to achieve similar performance, compromising reliability because collisions are missed, or reported in error, as a result of the geometric inaccuracies. The CDM’s market leading combination of performance and accuracy has lead to its adoption across the PLM industry. In addition to Camio Studio from Metris, applications that have integrated the CDM include Autodesk Inventor® (Autodesk), ICAD/SX™ (DIPRO), OneSpace Designer™ (CoCreate), SolidWorks® (SolidWorks), thinkdesign™ (think3) and UGS’ own Solid Edge®.
“As a result of our commitment to continually enhance our open PLM Components, we are constantly delivering innovative product developments to our global customer base,” said Bruce Feldt, vice president of Open Tools at UGS. “We are pleased to make the results of our developments available to Metris, bringing the most reliable solution for rapid collision detection to Camio Studio users.”
About PLM Components and D-Cubed
UGS’ PLM Components are open software tools designed to promote industry standardization and interoperability within the product lifecycle management (PLM) market. Many of the world’s leading CAD/CAM/CAE/PLM vendors have adopted the widely respected solutions from PLM Components for integration into their applications. D Cubed software is part of the PLM Components suite of solutions and represents a family of geometric software components that enable key functionality in CAD, CAM, CAE, and PLM applications, including sketching, part and assembly modeling, motion simulation, collision detection, clearance measurement and hidden-line visualization. D-Cubed also provides consultancy based software integration services in support of the PLM Open vision. For more information, please visit www.ugs.com/products/open/.
Metris designs, develops and markets a unique range of 3D hardware and software inspection systems for the automotive and aerospace sectors. The company offers world-class metrology solutions for both design and manufacturing communities. The comprehensive product family covers the full range of measurement volumes required by customers, in both fixed and portable configurations and with optical and touch sensors. www.metris.com.
UGS is a leading global provider of product lifecycle management (PLM) software and services with nearly 4 million licensed seats and 46,000 customers worldwide. Headquartered in Plano, Texas, UGS’ vision is to enable a world where organizations and their partners collaborate through global innovation networks to deliver world-class products and services while leveraging UGS’ open enterprise solutions, fulfilling the mission of enabling them to transform their process of innovation.
Note: UGS, D-Cubed, Transforming the process of innovation and Solid Edge are trademarks or registered trademarks of UGS Corp. or its subsidiaries in the United States and in other countries. Camio Studio is a trademark of Metris. Autodesk Inventor is a registered trademark of Autodesk Corporation. ICAD/SX is a trademark of Digital Process Ltd. OneSpace Designer is a trademark of CoCreate Software GmbH & Co. KG. SolidWorks is a registered trademark of SolidWorks Corporation. All other trademarks, registered trademarks or service marks belong to their respective holders.
The statements in this news release that are not historical statements, including statements regarding the expected benefits of the customer relationship, the successfulness of the implementation, expected benefits of the product, adoption by customers, continued innovation and other statements identified by forward looking terms such as "may," "will," "expect," "plan," "anticipate" or "project," are forward-looking statements. These statements are subject to numerous risks and uncertainties which could cause actual results to differ materially from such statements, including, among others, risks relating to loss or downsizing of customers, competition, international operations and exchange rate fluctuations, changes in pricing models, and intellectual property. UGS has included a discussion of these and other pertinent risk factors in its annual report on Form 10-K most recently filed with the SEC. UGS disclaims any intention or obligation to update or revise any forward-looking statements, whether as a result of new information, future events or otherwise.